2. Institute of TechnologyTallaght10 Sept 09 Fiachra Green Confidential: ©Phive Plasma Technologies

3. Phive company background Confidential: ©Phive Plasma Technologies Phive was set up in 2006 to exploit a new configuration of plasma sources for industrial uses. Plasma sources allow for the generation and control of low temperature plasmas for the modification, etching and chemical deposition processes on different materials This new plasma source technology has been developed by Dr Bert Ellingboe in Dublin City University, a veteran of the Semi and flat panel display business’s and extensively published in the field of plasma physics The CEO is Bernard Hensey, after a chance meeting with Bert, liked the innovations and supported the start up Fiachra Green joined in 2008 after 16 years with Applied Materials

4. Technology - Plasma Confidential: ©Phive Plasma Technologies

5. Technology – how to generate Plasma Gas mixture H2:SiH4 RF Showerhead Plasma Substrate Heater Pump Exhaust Confidential: ©Phive Plasma Technologies

6. Technology – Where to use it Confidential: ©Phive Plasma Technologies

7. The Solar PV Industry Why Pick Solar? Semi in the doldrums – next generation expected 2014-2016 Flat panels dominated by 1 Company Fusion is later Semi fabs being converted to solar factories Solar is a fast growing industry 30% CAGR for a-Si last 15 years Thin film Solar has a well defined problem which limits it ability to be cost competitive with current electricity generation costs ($0.3-$0.4/kWh Vs $0.1/kWh)… …and Phive has a solution to the problem Government sponsor, US, Japan, Europe Confidential: ©Phive Plasma Technologies

8. Plasma Enhanced Chemical Vapour Deposition PECVD is used to apply a thin film of silicon on a substrate to make PV solar panels ©Phive Plasma Technologies

9. Cost reduction is needed to meet grid parity and throughput is the major cost driver Silicon deposition rate is too slow and is the biggest factory throughput limiter today. The solution is to increase deposition rate by increasing RF Frequency This has its limitations, increasing frequency decreases the size of panel you can deposit onto... Uni-solar= 3Å/s limited by frequency Applied Materials = 3-6Å/s limited by frequency Oerlikon = 5-7Å/s limited by frequency Phive = 12Å/s ~ 20Å/s unlimited by frequency ©Phive Plasma Technologies The Problem Competition Phive Going from 3 to 20 Å/s increase the Fab capacity from 30Mw to 100Mw

10. a-Si Solar PV production line Confidential: ©Phive Plasma Technologies 70MW = $200M = $140M Plasma deposition equipment makes up ~70% of the capital costs of a thin film PV Solar manufacturing facility

11. With Phive Plasma Sources Confidential: ©Phive Plasma Technologies 70MW = $137M = $77M Using Phive Technology Can reduces capex costs by 31% And will make a-Si solar cost competitive with grid rates

12. Products We sell fully tested advanced plasma source modules that can be easily inserted into a new tool build or retrofitted to an existing tool 10%-20% of the value of a full PECVD tool market size of 2012 ~€250M ©Phive Plasma Technologies

13. R+D Roadmap Confidential: ©Phive Plasma Technologies

14. Summary Phive has developed hardware which allows plasma processing to occur at higher frequencies and larger areas than are currently available Phive plans to concentrate on the Solar PV market with planned product release in 2010-2011 Will continue to develop its solar capability Plan to be ready for Semi upturn in R&D 2011 ©Phive Plasma Technologies

15. Summary ©Phive Plasma Technologies