Page 1
© Oxford Instruments 2013
The Business of Science®
Oxford Instruments
Nanotechnology Tools
Capital Equipment
consid...
Page 2
© Oxford Instruments 2013
The Business of Science®
Our History
Page 3
© Oxford Instruments 2013
The Business of Science®
Nanotechnology Tools Sector
Global Service
Industrial Products S...
Page 4
© Oxford Instruments 2013
The Business of Science®
Nanotechnology Tools Sector
OI Nanotechnology Tools Sector
Omicr...
Page 5
© Oxford Instruments 2013
The Business of Science®
• Understand needs of the
research field and develop
tools to me...
Page 6© Oxford Instruments 2013
The Business of Science®
• Electronic devices
• Reducing growth costs
• Wafer level scalin...
Page 7© Oxford Instruments 2013
The Business of Science®
2d materials synthesis
Page 8© Oxford Instruments 2013
The Business of Science®
Page 9© Oxford Instruments 2013
The Business of Science®
Solutions for fundamental
research
MBE and Cluster tools
Page 10© Oxford Instruments 2013
The Business of Science®
• MBE - Wafer scale fabrication of Graphene based devices
Ö. Bar...
Page 11
© Oxford Instruments 2013
The Business of Science®
Combination of Growth and
Analysis Systems
4” Si/Ge MBE Cluster...
Page 12© Oxford Instruments 2013
The Business of Science®
Applied Research and Pilot line
tools
CVD,PECVD and ALD
Page 13© Oxford Instruments 2013
The Business of Science®
• PECVD
• 200 mm substrate, parallel plate configuration
Nanofab...
Page 14© Oxford Instruments 2013
The Business of Science®
• PECVD/ CVD process, cold wall
• 400°C for silicon nanowires
• ...
Page 15© Oxford Instruments 2013
The Business of Science®
• Dual frequency 13.56MHz
and 50KHz power applied
to upper elect...
Page 16© Oxford Instruments 2013
The Business of Science®
ICP remote plasma head
• High density films for much lower
tempe...
Page 17© Oxford Instruments 2013
The Business of Science®
• Active spacer for independent uniformity
control and increased...
Page 18© Oxford Instruments 2013
The Business of Science®
Process Capability
Nanofab 700 Nanofab 800 Agile Nanofab 1000 Ag...
Page 19© Oxford Instruments 2013
The Business of Science®
Carbon Nanotubes
Page 20© Oxford Instruments 2013
The Business of Science®
• MWCNT growth on Fe/Ni
Results courtesy IMEC
Page 21© Oxford Instruments 2013
The Business of Science®
Dense Bush Carbon Nanotubes
~34µm
Page 22© Oxford Instruments 2013
The Business of Science®
Carbon nanotubes
– process flow for via interconnect
Vias in Si
...
Page 23© Oxford Instruments 2013
The Business of Science®
Via interconnect CNT growth
Page 24© Oxford Instruments 2013
The Business of Science®
ALD
Dielectric deposition for nanoelectronics
Page 25© Oxford Instruments 2013
The Business of Science®
• Load lock System
• Extensive process capability
• Precursor op...
Page 26© Oxford Instruments 2013
The Business of Science®
FlexAl in situ Analysis
Page 27© Oxford Instruments 2013
The Business of Science®
Graphene and other 2d Materials
Nanofab tools
Page 28© Oxford Instruments 2013
The Business of Science®
• NanofabTM 1000Agile
• High performance growth of
nanotubes & n...
Page 29© Oxford Instruments 2013
The Business of Science®
• OIPT already has proven capability for
the growth of novel mat...
Page 30© Oxford Instruments 2013
The Business of Science®
• Need for reliable process tools
• Development in collaboration...
Page 31
© Oxford Instruments 2013
The Business of Science®
OIPT: Shaping The Future
Using innovation to turn smart science...
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Hvm ravi sundaram public

  1. 1. Page 1 © Oxford Instruments 2013 The Business of Science® Oxford Instruments Nanotechnology Tools Capital Equipment considerations for 2d materials moving from Lab to Fab Dr Ravi Sundaram HVM Graphene+ 2014 Conference Oxford, UK 15 May www.hvm-uk.com
  2. 2. Page 2 © Oxford Instruments 2013 The Business of Science® Our History
  3. 3. Page 3 © Oxford Instruments 2013 The Business of Science® Nanotechnology Tools Sector Global Service Industrial Products Sector Fabrication & Analysis at the Nanoscale Industrial Analysis • XRF, OES, MRI Industrial Products • Superconductors • X-Ray Technology • Cryopumping 3rd party Service • MRI and CT OI Product Support • Global presence Our Businesses
  4. 4. Page 4 © Oxford Instruments 2013 The Business of Science® Nanotechnology Tools Sector OI Nanotechnology Tools Sector Omicron NanoScience NanoAnalysis Plasma Technology
  5. 5. Page 5 © Oxford Instruments 2013 The Business of Science® • Understand needs of the research field and develop tools to meet requirement • Provide world leading tools and process solutions to emerging production markets Partnering with customers and suppliers to: Our Strategy
  6. 6. Page 6© Oxford Instruments 2013 The Business of Science® • Electronic devices • Reducing growth costs • Wafer level scaling • Handling thin films • Band gap engineering • Encapsulation • Atomic level lithography • New device Physics • System integration • Energy Storage • Electrochemical interactions • Development of heterostructures • Producing stable doping • Composite Materials • Producing materials cost effectively • Bonding with polymer matrix • Sensors • Selectivity • Surface activation and functionalisation Challenges
  7. 7. Page 7© Oxford Instruments 2013 The Business of Science® 2d materials synthesis
  8. 8. Page 8© Oxford Instruments 2013 The Business of Science®
  9. 9. Page 9© Oxford Instruments 2013 The Business of Science® Solutions for fundamental research MBE and Cluster tools
  10. 10. Page 10© Oxford Instruments 2013 The Business of Science® • MBE - Wafer scale fabrication of Graphene based devices Ö. Barbaros, NUS Singapore • Use of wafer-scaled Graphene in spintronics • Magnetic devices based on spin transfer torque in graphene • Most advanced UHV and source technology tailored to the application
  11. 11. Page 11 © Oxford Instruments 2013 The Business of Science® Combination of Growth and Analysis Systems 4” Si/Ge MBE Cluster Tool & Analysis (Wallace, UTD Dallas) 11 MBE Module PVD Sputter Module Wafer Annealing Module 4” wafers and 1” stubs spectroscopy module with - Monochromated XPS - High intensity UPS, AES, ISS 4” Large Sample AFM PVD Metal Evaporation Module
  12. 12. Page 12© Oxford Instruments 2013 The Business of Science® Applied Research and Pilot line tools CVD,PECVD and ALD
  13. 13. Page 13© Oxford Instruments 2013 The Business of Science® • PECVD • 200 mm substrate, parallel plate configuration Nanofab 100
  14. 14. Page 14© Oxford Instruments 2013 The Business of Science® • PECVD/ CVD process, cold wall • 400°C for silicon nanowires • 700°C for multiwall carbon nanotubes, ZnO • 800°C for single wall nanotubes • 1000°C graphene • External delivery module for liquid precursors Nanofab 100: A multi process tool
  15. 15. Page 15© Oxford Instruments 2013 The Business of Science® • Dual frequency 13.56MHz and 50KHz power applied to upper electrode enabling stress control and film densification • Gas inlet and showerhead assembly designed for uniform gas flow and low particle generation • View port and optical emission spectroscopy (OES) port PECVD Hardware
  16. 16. Page 16© Oxford Instruments 2013 The Business of Science® ICP remote plasma head • High density films for much lower temperatures than PECVD. • High density plasmas in low pressure range • Low damage deposition on to temperature sensitive substrates • Processes specifically developed to minimise surface ion damage Inductively Coupled coil (connected to 13.56MHz generator)
  17. 17. Page 17© Oxford Instruments 2013 The Business of Science® • Active spacer for independent uniformity control and increased plasma density • Optimised AMU which delivers greater efficiency, enhanced process repeatability and hardware reliability • Easy striking (via matching unit control and/or electromagnet option) • Low power operation (<200W) for low damage/nano applications • Diagnostic ports available for OES, interferometry, and in-line RF diagnostics Cobra - High Density Plasma Source Low Temp SiNx at 80ºC
  18. 18. Page 18© Oxford Instruments 2013 The Business of Science® Process Capability Nanofab 700 Nanofab 800 Agile Nanofab 1000 Agile Thin Film Process SiOx, SiNx,aSiC, aSi, µc-Si, polySi* SiOx, SiNx, aSiC, aSi, µc-Si polySi SiOx, SiNx, aSiC, aSi, µc-Si, polySi 1D Nano materials MWNTs Si, Ge NWs ZnO NWs MWNTs, SWNTs* Si, Ge NWs MWNTs, SWNTs Si, Ge NWs 2D Nano materials NCG, Vertical Graphene NCG, Vertical, CVD Graphene, BN,* MoS2 * O2 compatibility (>400°C) Compatible Non- Compatible Non- Compatible * Please contact OIPT for more detail on the marked material with the tool. Tool Process
  19. 19. Page 19© Oxford Instruments 2013 The Business of Science® Carbon Nanotubes
  20. 20. Page 20© Oxford Instruments 2013 The Business of Science® • MWCNT growth on Fe/Ni Results courtesy IMEC
  21. 21. Page 21© Oxford Instruments 2013 The Business of Science® Dense Bush Carbon Nanotubes ~34µm
  22. 22. Page 22© Oxford Instruments 2013 The Business of Science® Carbon nanotubes – process flow for via interconnect Vias in Si Thin film dep Nanoparticle formation by annealing Protection of NPs in via CMP CVD growth of CNTs
  23. 23. Page 23© Oxford Instruments 2013 The Business of Science® Via interconnect CNT growth
  24. 24. Page 24© Oxford Instruments 2013 The Business of Science® ALD Dielectric deposition for nanoelectronics
  25. 25. Page 25© Oxford Instruments 2013 The Business of Science® • Load lock System • Extensive process capability • Precursor options for research (up to 100g) and production (up to 500g) • Up to 8 liquid/solid precursors (3+3+1+1) • Up to 10 gas precursors • Water as standard • Ozone as option FlexAL-Atomic Layer Deposition Systems: Dielectrics deposition for 2d nanoelectronics • Clusterable • Optional turbo pump for moisture sensitive nitrides
  26. 26. Page 26© Oxford Instruments 2013 The Business of Science® FlexAl in situ Analysis
  27. 27. Page 27© Oxford Instruments 2013 The Business of Science® Graphene and other 2d Materials Nanofab tools
  28. 28. Page 28© Oxford Instruments 2013 The Business of Science® • NanofabTM 1000Agile • High performance growth of nanotubes & nanowires • PECVD and ICP options • Rigorous process control Graphene Growth NCG Film on 150mm Silicon Wafer NCG Film on 150mm Silicon Wafer Marek E. Schmidt1), Cigang Xu2), Mike Cooke2), Hiroshi Mizuta1), and Harold M. H. Chong1) 1 Nano Research Group, School of Electronics and Computer Science, University of Southampton, UK 2 Oxford Instruments Plasma Technology, Bristol, UK 1000 1500 2000 2500 3000 Intensity(a.u) Raman shift (cm-1) Graphene grown on Cu
  29. 29. Page 29© Oxford Instruments 2013 The Business of Science® • OIPT already has proven capability for the growth of novel materials using liquid precursors • PECVD • ALD • Combining these techniques could open up the path to advance the fabrication of hetero-structures and commercial viable devices based upon 2D materials Precursor Delivery: Towards other 2D materials
  30. 30. Page 30© Oxford Instruments 2013 The Business of Science® • Need for reliable process tools • Development in collaboration with end users • Reliability and automation would be issues to look out for going from lab to fab • 30+ years experience in providing a long term support to both research and production customers Summary
  31. 31. Page 31 © Oxford Instruments 2013 The Business of Science® OIPT: Shaping The Future Using innovation to turn smart science into world class products Thank You!

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