Personal Information
Entreprise/Lieu de travail
Helsinki Area, Finland Finland
Profession
Associate Professor at Aalto University
Secteur d’activité
Education
À propos
Researcher with an open, curious mind. Associate professor at Aalto University (60% until July 2017; full time thereafter); senior scientist at VTT (40% until the end of July 2017). Profile: https://people.aalto.fi/en/riikka_puurunen.
My general area of expertise is the Atomic Layer Deposition (ALD) technique. With ALD, I have worked since 1998, first related to catalyst synthesis (Microchemistry, Neste Oil and Gas, and Helsinki University of Technology, nowadays known Aalto University, Finland), then for transistor gate oxide development (IMEC, Belgium), and 2004-2017 for the development of microelectromechanical systems, MEMS (VTT, Finland). I have been managing Finnish research proje...
Mots-clés
atomic layer deposition
molecular layering
atomic layer epitaxy
ald
virtual project on the history of ald
aldhistory
vpha
al2o3
ale
conformality
surface chemistry
heterogeneous catalysis
aleskovskii
koltsov
trimethylaluminum
trimethylaluminium
history
ml
modelling
ald history
reaction mechanisms
suntola
tio2
molekulyarnoe naslaivanie
aldep
"molecular layering"
open source
open data
open science
sticking coefficient
langmuir adsorption
diffusion-reaction model
fundamental concepts
tmawater
slideshare
reupload
catalysis
science and technology
teaching
moore's law
panopto
pillarhall
thin film
island grouwth
hfo2
model
mechanical properties
micro electro mechanical systems
mems
ato
electrical measurements
nanolaminate
science
ussr
st. petersburg
bubble
solubility
"molekulyarnoe naslaivanie"
"virtual project"
"atomic layer epitaxy"
"atomic layer deposition"
Tout plus
Présentations
(20)Documents
(2)Personal Information
Entreprise/Lieu de travail
Helsinki Area, Finland Finland
Profession
Associate Professor at Aalto University
Secteur d’activité
Education
À propos
Researcher with an open, curious mind. Associate professor at Aalto University (60% until July 2017; full time thereafter); senior scientist at VTT (40% until the end of July 2017). Profile: https://people.aalto.fi/en/riikka_puurunen.
My general area of expertise is the Atomic Layer Deposition (ALD) technique. With ALD, I have worked since 1998, first related to catalyst synthesis (Microchemistry, Neste Oil and Gas, and Helsinki University of Technology, nowadays known Aalto University, Finland), then for transistor gate oxide development (IMEC, Belgium), and 2004-2017 for the development of microelectromechanical systems, MEMS (VTT, Finland). I have been managing Finnish research proje...
Mots-clés
atomic layer deposition
molecular layering
atomic layer epitaxy
ald
virtual project on the history of ald
aldhistory
vpha
al2o3
ale
conformality
surface chemistry
heterogeneous catalysis
aleskovskii
koltsov
trimethylaluminum
trimethylaluminium
history
ml
modelling
ald history
reaction mechanisms
suntola
tio2
molekulyarnoe naslaivanie
aldep
"molecular layering"
open source
open data
open science
sticking coefficient
langmuir adsorption
diffusion-reaction model
fundamental concepts
tmawater
slideshare
reupload
catalysis
science and technology
teaching
moore's law
panopto
pillarhall
thin film
island grouwth
hfo2
model
mechanical properties
micro electro mechanical systems
mems
ato
electrical measurements
nanolaminate
science
ussr
st. petersburg
bubble
solubility
"molekulyarnoe naslaivanie"
"virtual project"
"atomic layer epitaxy"
"atomic layer deposition"
Tout plus